Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Stitch insertion for reducing color density differences in double patterning technology (DPT)

Stitch insertion for reducing color density differences in double patterning technology (DPT)

US Patent 8918745 · Granted Dec 23, 2014

Estimated economic value: $2,667,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods for idle fuel economy mode2021
Systems and methods for idle fuel economy mode2019
IC layout post-decomposition mask allocation optimization2019
IC layout post-decomposition mask allocation optimization2019
Feed-forward for silicon inspections (DFM2CFM : design to silicon) and feed-back2018
Method, system and program product for identifying anomalies in integrated circu2018
Automated design layout pattern correction based on context-aware patterns2014
Automated design layout pattern correction based on context-aware patterns2014
Methods involving pattern matching to identify and resolve potential non-double-2014
Methods involving pattern matching to identify and resolve potential non-double-2014
Layout pattern correction for integrated circuits2014
Method and apparatus for applying post graphic data system stream enhancements2014