Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods of producing structures using a developer-soluble layer with multilayer technology

Methods of producing structures using a developer-soluble layer with multilayer technology

US Patent 8877430 · Granted Nov 4, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for real-time clock module of system-on-chip2024
Processes to pattern small features for advanced patterning needs2018
Processes to pattern small features for advanced patterning needs2018
Spin-on spacer materials for double- and triple-patterning lithography2017
All-organic inductor-capacitor tank circuit for radio frequency sensor applicati2017
Assist layers for EUV lithography2015
Fluorinated polyimides with fluorene cardo structure as optical materials that h2014
Crosslinkable fill compositions for uniformly protecting via and contact holes2011
Automated process and apparatus for planarization of topographical surfaces2010
Method of filling structures for forming via-first dual damascene interconnects2009
Planarization method for multi-layer lithography processing2008
Lithography pattern shrink process and articles2008