Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Self-aligned double patterning via enclosure design

Self-aligned double patterning via enclosure design

US Patent 8839168 · Granted Sep 16, 2014

Estimated economic value: $1,458,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Laser printed lensed optical fibers and associated methods2025
Route deviation quantification and vehicular route learning based thereon2025
Organic light-emitting diode display with passive leakage-reducing structures2025
Memory fault recovery method and system, and memory2025
Laser-cleaving of an optical fiber array with controlled cleaving angle2025
Method for preparing negative electrode sheet of nickel-metal hydride battery2025
Recirculating roller bearing2025
Calibration parameter obtaining method and apparatus, processor, and electronic 2024
Organic light-emitting diode display with active leakage-reducing structures2024
Welding seam tracking sensor2023
Route deviation quantification and vehicular route learning based thereon2023
Laser-cleaving of an optical fiber array with controlled cleaving angle2023