Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Silicon-containing resist underlayer film-forming composition and patterning process

Silicon-containing resist underlayer film-forming composition and patterning process

US Patent 8715913 · Granted May 6, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Material for forming adhesive film, method for forming adhesive film using the s2025
Information processing device for determining motion sickness of an animal2025
Material for forming organic film, patterning process, and polymer2025
Material for forming adhesive film, patterning process, and method for forming a2025
Thermosetting iodine- and silicon-containing material, composition containing th2025
Composition for forming silicon-containing resist underlayer film, patterning pr2025
Composition for forming silicon-containing resist underlayer film and patterning2024
Electromagnetic wave shielding molded article2024
Coating-type composition for forming organic film, patterning process, polymer, 2024
Composition for forming silicon-containing resist underlayer film and patterning2024
Composition for forming organic film, patterning process, and polymer2024
Silanol compound and method for producing silanol compound2024