Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern

Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern

US Patent 8697344 · Granted Apr 15, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Composition for chemical-mechanical polishing and chemical-mechanical polishing 2024
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2023
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2023
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2021
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2021
Composition for film formation, film, resist underlayer film-forming method, pro2021
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2020
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2020
Apparatus for acquiring electric activity in the brain and utilization of the sa2019
Cell culture package and package containing cell-culture material2019
Magnetic resonance measurement apparatus with improved instruction sequence tran2019
Safety cabinet2019