Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for self-aligned doubled patterning lithography

Method for self-aligned doubled patterning lithography

US Patent 8679981 · Granted Mar 25, 2014

Estimated economic value: $5,226,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Finding semiconductor defects using convolutional context attributes2025
Inspection of reticles using machine learning2024
Inspection with previous step subtraction2024
Setting up inspection of a specimen2023
Defect inspection and review using transmissive current image of charged particl2022
Wafer inspection using difference images2022
Inspection of reticles using machine learning2022
Apparatus and methods for measuring phase and amplitude of light through a layer2021
Arbitrary wavefront compensator for deep ultraviolet (DUV) optical imaging syste2020
Block-to-block reticle inspection2020
Apparatus and methods for inspecting reticles2019
Apparatus and methods for predicting wafer-level defect printability2019