Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process

Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process

US Patent 8679980 · Granted Mar 25, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemical mechanical polishing composition2024
Woody rootstock for efficient grafting of solanaceous vegetables and efficient g2023
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt2022
Chemical-mechanical polishing composition comprising benzotriazole derivatives a2021
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt2021
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt2020
Chemical-mechanical polishing composition comprising benzotriazole derivatives a2020
Chemical mechanical polishing (CMP) composition2020
Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine2019
Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine2019
Process for removing a bulk material layer from a substrate and a chemical mecha2019