Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Etching composition for metal material and method for manufacturing semiconductor device by using same

Etching composition for metal material and method for manufacturing semiconductor device by using same

US Patent 8658053 · Granted Feb 25, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Cleaning liquid composition, method for cleaning semiconductor element, and meth2017
Cleaning liquid composition, method for cleaning semiconductor element, and meth2017
Cleaning liquid for semiconductor elements and cleaning method using same2016
Processing liquid for suppressing pattern collapse of fine metal structure and m2016
Processing liquid for suppressing pattern collapse of fine metal structure, and 2015
Treatment liquid for inhibiting pattern collapse in microstructures, and microst2015
Silicon etching liquid and etching method2014
Method for producing transistor2014
Composition for cleaning and rust prevention and process for producing semicondu2014
Silicon etching liquid and etching method2013
Cleaning solution for semiconductor device or display device, and cleaning metho2011
Cleaning composition and process for producing semiconductor device2011