Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Final polishing method for silicon single crystal wafer and silicon single crystal wafer

Final polishing method for silicon single crystal wafer and silicon single crystal wafer

US Patent 8569148 · Granted Oct 29, 2013

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of manufacturing epitaxial wafer and silicon-based substrate for epitaxia2019
Method for producing semiconductor epitaxial wafer and semiconductor epitaxial w2018
Silicon wafer and a silicon epitaxial wafer having a polycrystal silicon layer f2015
Wafer and epitaxial wafer, and manufacturing processes therefor2012
Contamination monitoring system2000
Method of monitoring fluid contamination1998
Method for deodorizing and refreshing for dry cleaning1996
Method for deodorizing and refreshing for dry cleaning and dry cleaning apparatu1996