Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sensor array for measuring plasma characteristics in plasma processing environments

Sensor array for measuring plasma characteristics in plasma processing environments

US Patent 8545669 · Granted Oct 1, 2013

Estimated economic value: $25,331,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Gliding arc discharge sterilization of surfaces, objects, and ambient air2025
Systems and methods for optimizing RF plasma power coupling2023
Atmospheric-pressure plasma processing apparatus and method using argon plasma g2023
Atmospheric-pressure plasma processing apparatus and method2021
Arc management with voltage reversal and improved recovery2017
High frequency filter for improved RF bias signal stability2017
Adjustable non-dissipative voltage boosting snubber network for achieving large 2017
Adjustable non-dissipative voltage boosting snubber network for achieving large 2016
Arc management with voltage reversal and improved recovery2016
Adjustable non-dissipative voltage boosting snubber network for achieving large 2015
Methods and apparatus for sputtering using direct current2015
Power converter with preemptive protection2015