Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and apparatus for sputtering using direct current

Methods and apparatus for sputtering using direct current

US Patent 9150960 · Granted Oct 6, 2015

Estimated economic value: $7,575,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

RF sputtering of multiple electrodes with optimized plasma coupling through the 2025
System and method for balancing consumption of targets in pulsed dual magnetron 2017
Arc management with voltage reversal and improved recovery2017
Arc management with voltage reversal and improved recovery2017
Adjustable non-dissipative voltage boosting snubber network for achieving large 2017
Adjustable non-dissipative voltage boosting snubber network for achieving large 2016
Arc management with voltage reversal and improved recovery2016
Arc management with voltage reversal and improved recovery2016
Adjustable non-dissipative voltage boosting snubber network for achieving large 2015
Differing boost voltages applied to two or more anodeless electrodes for plasma 2015
Power converter with preemptive protection2015
Proactive arc management of a plasma load2013