Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gate patterning of nano-channel devices

Gate patterning of nano-channel devices

US Patent 8445948 · Granted May 21, 2013

Estimated economic value: $6,083,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Solid-state switch2025
Dimethylarsinous acid-induced malignantly transformed cell line of human keratin2025
Multi-layer topological interconnect with proximal doping layer2025
Phase-change memory device with conductive cladding2025
Piezoelectric memory2025
Vanity mirror with second mirror assembly magnetically attached thereto2025
Containers with multiple sensors2025
Phase-change memory cell with mixed-material switchable region2025
Applying inert ion beam etching for improving a profile and repairing sidewall d2025
RRAM filament location for physically unclonable function2025
Ion beam sputtering with ion assisted deposition for coatings on chamber compone2025
Integrated circuit security using programmable switches2024