Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for quantitative inline material characterization in semiconductor production processes based on structural measurements and related models

Method and system for quantitative inline material characterization in semiconductor production processes based on structural measurements and related models

US Patent 8423320 · Granted Apr 16, 2013

Estimated economic value: $3,756,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus for unified speech and audio decoding improvements2025
Methods, apparatus and systems for three degrees of freedom (3DOF+) extension of2025
Methods, apparatus and systems for representation, encoding, and decoding of dis2025
Methods, apparatus and systems for generation, transportation and processing of 2025
Methods, apparatus and systems for diffraction modelling based on grid pathfindi2025
Method and system for handling local transitions between listening positions in 2025
Methods and devices for generation and processing of modified bitstreams2025
Audio decoder, apparatus for generating encoded audio output data and methods pe2024
Audio decoder, apparatus for generating encoded audio output data and methods pe2024
Method and system for handling global transitions between listening positions in2024
Methods, apparatus and systems for 6DOF audio rendering and data representations2024
Audio decoder, apparatus for generating encoded audio output data and methods pe2024