Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and apparatus for supporting substrates

Methods and apparatus for supporting substrates

US Patent 8365682 · Granted Feb 5, 2013

Estimated economic value: $10,826,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Film stress control for plasma enhanced chemical vapor deposition2025
Large-area high-density plasma processing chamber for flat panel displays2025
Flat head units for heavy load alignment2024
Deposition chamber system diffuser with increased power efficiency2024
System for forming nano-laminate optical coating2024
Roll-aboard travel bag2024
Film stress control for plasma enhanced chemical vapor deposition2023
Gas confiner assembly for eliminating shadow frame2023
Gas diffusion shower head design for large area plasma enhanced chemical vapor d2023
RF choke for gas delivery to an RF driven electrode in a plasma processing appar2022
RF choke for gas delivery to an RF driven electrode in a plasma processing appar2022
Roll-aboard garment bag2022