Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscus

Methods for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscus

US Patent 8287656 · Granted Oct 16, 2012

Estimated economic value: $13,488,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Actively heated aluminum baffle component having improved particle performance a2014
System and method for monitoring wafer stress2012
Methods of and apparatus for correlating gap value to meniscus stability in proc2011
Methods of and apparatus for correlating gap value to meniscus stability in proc2011
Methods of and apparatus for correlating gap value to meniscus stability in proc2011
Gas mixture for removing photoresist and post etch residue from low-k dielectric2009
Method and system for chemical mechanical polishing pad cleaning2007
Method and apparatus for simultaneously cleaning the front side and back side of2007
End-point detection apparatus2006
Method and system for cleaning a chemical mechanical polishing pad2006
Method for controlling galvanic corrosion effects on a single-wafer cleaning sys2005
In-situ local heating using megasonic transducer resonator2005