Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Ultra-thin film formation using gas cluster ion beam processing

Ultra-thin film formation using gas cluster ion beam processing

US Patent 8226835 · Granted Jul 24, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Techniques and apparatus for selective shaping of mask features using angled bea2025
Devices and methods for DRAM leakage reduction2025
Method for depositing layers directly adjacent uncovered vias or contact holes2025
Ribbon beam plasma enhanced chemical vapor deposition system for anisotropic dep2025
Multi process air gap formation2024
Techniques for void-free material depositions2024
Directional etch for improved dual deck three-dimensional NAND architecture marg2024
High aspect ratio taper improvement using directional deposition2024
Semiconductor device cavity formation using directional deposition2024
Techniques to engineer nanoscale patterned features using ions2024
Wordline contact formation in NAND devices2023
Techniques for void-free material depositions2023