Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Techniques and apparatus for selective shaping of mask features using angled beams

Techniques and apparatus for selective shaping of mask features using angled beams

US Patent 12417923 · Granted Sep 16, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Devices and methods for DRAM leakage reduction2025
Method for depositing layers directly adjacent uncovered vias or contact holes2025
Ribbon beam plasma enhanced chemical vapor deposition system for anisotropic dep2025
Multi process air gap formation2024
Techniques for void-free material depositions2024
Directional etch for improved dual deck three-dimensional NAND architecture marg2024
High aspect ratio taper improvement using directional deposition2024
Semiconductor device cavity formation using directional deposition2024
Techniques to engineer nanoscale patterned features using ions2024
Wordline contact formation in NAND devices2023
Techniques for void-free material depositions2023
Extreme edge uniformity control2023