Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High-Z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels

High-Z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels

US Patent 8120138 · Granted Feb 21, 2012

Estimated economic value: $5,017,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for process window optimization in a virtual semiconductor dev2025
Unsupervised cross-domain data augmentation for long-document based prediction a2025
System and method for performing process model calibration in a virtual semicond2024
Determination of recipes for manufacturing semiconductor devices2023
System and method for predictive 3-D virtual fabrication2023
Resist and etch modeling2023
Client-server multimedia archiving system with metadata encapsulation2022
Identification of molecules based on frequency responses using electromagnetic w2022
Hypergraph structure and truncation method that reduces computer processor execu2021
System and method for key parameter identification, process model calibration an2021
System and method for predictive 3-D virtual fabrication2021
Trenched sample assembly for detection of analytes with electromagnetic read-wri2021