Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Monitoring apparatus and method particularly useful in photolithographically processing substrates

Monitoring apparatus and method particularly useful in photolithographically processing substrates

US Patent 7821614 · Granted Oct 26, 2010

Estimated economic value: $2,295,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Mount for vertical photovoltaic modules2025
Pattern transfer printing of multi-layered features2025
Dynamic pattern transfer printing and pattern transfer sheets with spaced groups2025
System and method for detecting physical characteristics of a multilayered tissu2025
System and method for performing tear film structure measurement2024
Apparatus and methods for calibrating optical measurements2024
Pattern transfer printing systems and methods2024
System and method for performing tear film structure measurement2021
Apparatus and methods for performing tomography and/or topography measurements o2020
Apparatus and method for detecting surface topography2019
Method for analyzing an object2019
System for analyzing optical properties of an object2019