Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Treatment of the working layer of a multilayer structure

Treatment of the working layer of a multilayer structure

US Patent 7790048 · Granted Sep 7, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor structure for digital and radiofrequency applications, and method 2025
Method for forming a handling substrate for a composite structure intended for R2025
Semiconductor structure comprising a buried porous layer for RF applications2024
Hybrid structure for surface acoustic wave device and associated production meth2024
Substrate for radiofrequency applications and associated manufacturing method2023
Support for a semiconductor structure2022
Method for dissolving a buried oxide in a silicon-on-insulator wafer2020
Method for minimizing distortion of a signal in a radiofrequency circuit2020
Method for manufacturing a high-resistivity semiconductor-on-insulator substrate2018
Method for fabricating a semiconductor device including fin relaxation, and rela2017
Matching of transistors2016
Manufacturing method for a semiconductor on insulator type substrate for radiofr2015