Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Alternating phase shift mask inspection using biased inspection data

Alternating phase shift mask inspection using biased inspection data

US Patent 7742632 · Granted Jun 22, 2010

Estimated economic value: $6,664,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reticle carrier2014
Mask program defect test2013
Reticle carrier2013
Method and system for inspecting multi-layer reticles2013
EMF correction model calibration using asymmetry factor data obtained from aeria2012
Method of manufacture of damascene reticle2012
Photomask image inspection2011
Phase calibration for attenuating phase-shift masks2010
Mask inspection DNIR replacement based on location of tri-tone level database im2009
Mask inspection DNIR replacement based on location of tri-tone level database im2009
Method for correction of defects in lithography masks2009
Mask defect analysis system2009