Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Hard mask for low-k interlayer dielectric patterning

Hard mask for low-k interlayer dielectric patterning

US Patent 7649264 · Granted Jan 19, 2010

Estimated economic value: $22,167,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Soluble hard mask for interlayer dielectric patterning2010
High input/output density optoelectronic probe card for wafer-level test of elec2009
Back-side-of-die, through-wafer guided-wave optical clock distribution networks,2006
Guided-wave optical interconnections embedded within a microelectronic wafer-lev2005
Optical waveguides formed from nano air-gap inter-layer dielectric materials and2005
Elastomer reclaiming composition and method2004
Optical waveguides with embedded air-gap cladding layer and methods of fabricati2004
Backplane, printed wiring board, and/or multi-chip module-level optical intercon2004
Guided-wave optical interconnections embedded within a microelectronic wafer-lev2004