Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Soluble hard mask for interlayer dielectric patterning

Soluble hard mask for interlayer dielectric patterning

US Patent 7659196 · Granted Feb 9, 2010

Estimated economic value: $29,195,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods of transferring micro light emitting diode devices using electromagnetic2025
Apparatus for transferring plurality of micro devices and methods of fabrication2022
Electromagnetic tool for transferring micro devices and methods of transfer2021
Electromagnetic tool for transferring micro devices and methods of fabrication2021
Antireflective coatings for via fill and photolithography applications and metho2015
Dielectric spacers for metal interconnects and method to form the same2013
Antireflective coatings for via fill and photolithography applications and metho2011
Dielectric spacers for metal interconnects and method to form the same2011
Dielectric spacers for metal interconnects and method to form the same2010
Hard mask for low-k interlayer dielectric patterning2010
Cleaning composition and method of cleaning semiconductor substrate2008
Methods and apparatuses for producing a polymer memory device2008