Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Position measurement system and lithographic apparatus

Position measurement system and lithographic apparatus

US Patent 7599043 · Granted Oct 6, 2009

Estimated economic value: $7,859,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wavelength tracking system, method to calibrate a wavelength tracking system, li2025
Imprint apparatus with movable stages2024
Metrology apparatus2024
Lithographic apparatus2024
Interferometer system, method of determining a mode hop of a laser source of an 2023
Lithographic apparatus2023
Interferometric stage positioning apparatus2022
Interferometric stage positioning apparatus2022
Cyclic error measurements and calibration procedures in interferometers2022
Metrology apparatus2022
Lithographic apparatus2021
Position measurement of optical elements in a lithographic apparatus2021