Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polymer, resist composition and patterning process using the same

Polymer, resist composition and patterning process using the same

US Patent 7501223 · Granted Mar 10, 2009

Estimated economic value: $190,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemically amplified resist composition, photomask blank, method for forming res2025
Bio-electrode composition, bio-electrode, and method for manufacturing bio-elect2025
Crystal of 3-(difluoromethyl)-1-methyl-n-(1,1,3-trimethyl-2,3-dihydro-1H-inden-42025
Antireflective member, and polarizing plate, image display device and antireflec2025
Information processing apparatus, non-transitory computer readable medium storin2025
Onium salt, chemically amplified resist composition and patterning process2025
Phenol compound, conductive paste composition, method for producing conductive p2025
Positive photosensitive resin composition, positive photosensitive dry film, met2025
Negative photosensitive resin composition, patterning process, method for formin2025
Chemically amplified negative resist composition and resist pattern forming proc2024
Chemically amplified negative resist composition and resist pattern forming proc2024
Chemically amplified positive resist composition and resist pattern forming proc2024