Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for controlling a film formation process with multiple objectives

Method and apparatus for controlling a film formation process with multiple objectives

US Patent 7473566 · Granted Jan 6, 2009

Estimated economic value: $9,608,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Adjusting weighting of a parameter relating to fault detection based on a detect2014
Parallel fault detection2013
Method and apparatus for predicting yield parameters based on fault classificati2010
Method and apparatus for dynamically determining tester recipes2010
Method and apparatus for scheduling a plurality of processing tools2010
Method and apparatus for modifying process selectivities based on process state 2010
Method and apparatus for selecting wafers for sampling2008
Applying a self-adaptive filter to a drifting process2008
Method and apparatus for scheduling metrology based on a jeopardy count2007
Method and system for dynamically selecting wafer lots for metrology processing2007
Method of controlling exposure processes by monitoring photon levels, and system2007
Method and apparatus for calibrating degradable components using process state d2006