Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of controlling exposure processes by monitoring photon levels, and system for accomplishing same

Method of controlling exposure processes by monitoring photon levels, and system for accomplishing same

US Patent 7186487 · Granted Mar 6, 2007

Estimated economic value: $9,465,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Parallel fault detection2013
Method and apparatus for dynamically determining tester recipes2010
Method and apparatus for controlling a film formation process with multiple obje2009
Applying a self-adaptive filter to a drifting process2008
Determining transmission of error effects for improving parametric performance2006
Method and apparatus for fault classification based on residual vectors2006
Method and apparatus for providing excitation for a process controller2006
Method and apparatus for dynamically monitoring controller tuning parameters2005
Advanced process control of the manufacture of an oxide-nitride-oxide stack of a2005
Determining a next tool state based on fault detection information2005
Method and apparatus for controlling a fabrication process based on a measured e2005
Method and apparatus for modifying design constraints based on observed performa2005