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Home › Line-to-line reliability enhancement using a dielectric liner for a low dielectric constant interlevel and intralevel (or intermetal and intrametal) dielectric layer

Line-to-line reliability enhancement using a dielectric liner for a low dielectric constant interlevel and intralevel (or intermetal and intrametal) dielectric layer

US Patent 7402514 · Granted Jul 22, 2008

Estimated economic value: $4,786,000 ⓘ

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