Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Determining ion beam parallelism using refraction method

Determining ion beam parallelism using refraction method

US Patent 7397049 · Granted Jul 8, 2008

Estimated economic value: $6,044,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for controlled ion implantation2025
Techniques to increase CMOS image sensor well depth by cyrogenic ion channeling 2023
System and method for improved scanned spot beam2020
Selective processing of a workpiece2018
Systems and methods for gas pre-separation for detection of substances2017
Apparatus and method for controlling implant process2017
Techniques for improving the performance and extending the lifetime of an ion so2016
Method for ion implantation2016
Ion implant for defect control2016
Medium current ribbon beam for ion implantation2016
Ion source and a method for in-situ cleaning thereof2015
Apparatus and techniques for controlling ion implantation uniformity2015