Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for reducing the intrinsic stress of high density plasma films

Method for reducing the intrinsic stress of high density plasma films

US Patent 7294205 · Granted Nov 13, 2007

Estimated economic value: $11,470,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Low temperature silicon oxide coating for pharmaceutical applications2025
Rotary reactor for uniform particle coating with thin films2025
Coated drug compositions and methods of preparing the same2024
Particle coating methods and apparatus2024
Reactor for coating particles in stationary chamber with rotating paddles2024
Reactor for coating particles in stationary chamber with rotating paddles and ga2024
Low temperature process for preparing silicon oxide coated pharmaceuticals2024
Protection of components from corrosion2023
Protection of components from corrosion2023
Protection of components from corrosion2023
Methods of protecting aerospace components against corrosion and oxidation2023
Reactor for coating particles in stationary chamber with rotating paddles2023