Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Critical dimension analysis with simultaneous multiple angle of incidence measurements

Critical dimension analysis with simultaneous multiple angle of incidence measurements

US Patent 7248375 · Granted Jul 24, 2007

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Modulated reflectance measurement system using UV probe2014
Modulated reflectance measurement system using UV probe2014
High resolution monitoring of CD variations2011
Methods for depth profiling in semiconductors using modulated optical reflectanc2011
High resolution monitoring of CD variations2011
Scatterometry multi-structure shape definition with multi-periodicity2010
Methods for depth profiling in semiconductors using modulated optical reflectanc2010
Detector configurations for optical metrology2010
Modulated reflectance measurement system using UV probe2010
Modulated reflectance measurement system using UV probe2010
Modulated reflectance measurement system with multiple wavelengths2009
Global shape definition method for scatterometry2009