Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polishing system with in-line and in-situ metrology

Polishing system with in-line and in-situ metrology

US Patent 7101251 · Granted Sep 5, 2006

Estimated economic value: $12,664,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Passive acoustic monitoring and acoustic sensors for chemical mechanical polishi2025
Polishing apparatus using neural network for monitoring2025
Resistivity-based adjustment of thresholds for in-situ monitoring2025
Machine vision as input to a CMP process control algorithm2025
Imaging systems and methods for image-guided radiosurgery2025
Core configuration for in-situ electromagnetic induction monitoring system2024
Therapeutic radiation beam detector for radiation treatment systems2023
Revolving radiation collimator2023
Grouping spectral data from polishing substrates2023
Thickness measurement of substrate using color metrology2023
Front surface and back surface orientation detection of transparent substrate2023
Color imaging for CMP monitoring2023