Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing method for working the surface of semiconductor devices

Plasma processing method for working the surface of semiconductor devices

US Patent 7098138 · Granted Aug 29, 2006

Estimated economic value: $130,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vacuum processing method2024
Plasma processing apparatus and plasma processing method2022
Plasma processing apparatus and plasma processing method2022
Plasma processing method2022
Ring for a plasma processing apparatus2020
Plasma processing apparatus2020
Electrode plate peripheral ring for a plasma processing apparatus2019
Electrode cover for a plasma processing apparatus2019
Electrode plate for a plasma processing apparatus2019
Method for controlling plasma processing apparatus2019
Multilayered container2019
Plasma processing method and plasma processing apparatus2018