Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Radiation correction method for electron beam lithography

Radiation correction method for electron beam lithography

US Patent 6872507 · Granted Mar 29, 2005

Estimated economic value: $3,480,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

IC in-process solution to reduce thermal neutrons soft error rate2015
Soft error rate (SER) reduction in advanced silicon processes2014
Communication device, mixer and method thereof2010
Wireless network device with a signal detection function and switching method fo2009
Dual trench alternating phase shift mask fabrication2008
Mask for fabricating semiconductor devices and method for designing the same2008
Method of a floating pattern loading system in mask dry-etching critical dimensi2006
Dual trench alternating phase shift mask fabrication2006
Single trench alternating phase shift mask fabrication2004
Chrome mask dry etching process to reduce loading effect and defects2004
Process flow and pellicle type for 157 nm mask making2004
Dual trench alternating phase shift mask fabrication2003