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Home › Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species

Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species

US Patent 6848455 · Granted Feb 1, 2005

Estimated economic value: $9,036,000 ⓘ

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