Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fault classification in a plasma process chamber

Fault classification in a plasma process chamber

US Patent 6826489 · Granted Nov 30, 2004

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for process control of semiconductor manufacturing equipment2006
Method for process control of semiconductor manufacturing equipment2006
Radio frequency Langmuir probe2006
Plasma chamber cleaning2005
Method for fault detection in a plasma process2004
Endpoint detection in the etching of dielectric layers2004
Endpoint detection in the etching of dielectric layers2004
Plasma chamber conditioning2003
In-tank water conditioner valve2003
RF current sensor2002
Method of processing a high frequency signal containing multiple fundamental fre2002
Method for fault identification in a plasma process2002