Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Endpoint detection in the etching of dielectric layers

Endpoint detection in the etching of dielectric layers

US Patent 6677246 · Granted Jan 13, 2004

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for process control of semiconductor manufacturing equipment2006
Method for process control of semiconductor manufacturing equipment2006
Radio frequency Langmuir probe2006
Plasma chamber cleaning2005
Fault classification in a plasma process chamber2004
Fault classification in a plasma process chamber2004
Method for fault detection in a plasma process2004
Plasma chamber conditioning2003
In-tank water conditioner valve2003
RF current sensor2002
Method of processing a high frequency signal containing multiple fundamental fre2002
Method for fault identification in a plasma process2002