Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › EUVL mask structure and method of formation

EUVL mask structure and method of formation

US Patent 6777137 · Granted Aug 17, 2004

Estimated economic value: $5,840,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Adapter for a bike mount2023
Arm sling2022
Adapter for a bike mount2022
Calf wrap2022
Protection of photomasks from 193nm radiation damage using thin coatings of ALD 2021
Mounting pad for a calf wrap2021
Navigation of endoscopic devices by means of eye-tracker2021
Trocar system2020
Stay for a wrist brace2019
Glare reduction hood for a touchscreen display2019
Test pattern layout for test photomask and method for evaluating critical dimens2018
Test pattern layout for test photomask and method for evaluating critical dimens2018