Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit

Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit

US Patent 6737198 · Granted May 18, 2004

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device comprising an antiferroelectric gate insulating film2016
Semiconductor integrated circuit and pattern layouting method for the same2014
Semiconductor integrated circuit and pattern layouting method for the same2013
Simulator for a chemical mechanical polishing2008
Layout data saving method, layout data converting device and graphic verifying d2007
Projection aligner, aberration estimating mask pattern, aberration quantity esti2007
Mask data processor2006
Projection aligner, aberration estimating mask pattern, aberration quantity esti2005
Layout data saving method, layout data converting device and graphic verifying d2005
MASK DATA CORRECTION APPARATUS, FOURIER TRANSFORMATION APPARATUS, UP SAMPLING AP2004
Aberration estimating mask pattern2003
Method of forming a pattern using proximity-effect-correction2002