Issued Patents All Time
Showing 1–25 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9331212 | Semiconductor device comprising an antiferroelectric gate insulating film | — | 2016-05-03 |
| 8839176 | Semiconductor integrated circuit and pattern layouting method for the same | — | 2014-09-16 |
| 8543956 | Semiconductor integrated circuit and pattern layouting method for the same | — | 2013-09-24 |
| 7363207 | Simulator for a chemical mechanical polishing | — | 2008-04-22 |
| 7213217 | Layout data saving method, layout data converting device and graphic verifying device | — | 2007-05-01 |
| 7170682 | Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method | — | 2007-01-30 |
| 7020866 | Mask data processor | — | 2006-03-28 |
| 6970291 | Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method | — | 2005-11-29 |
| 6951004 | Layout data saving method, layout data converting device and graphic verifying device | — | 2005-09-27 |
| 6831997 | MASK DATA CORRECTION APPARATUS, FOURIER TRANSFORMATION APPARATUS, UP SAMPLING APPARATUS, DOWN SAMPLING APPARATUS, METHOD OF MANUFACTURING TRANSFER MASK, AND METHOD OF MANUFACTURING DEVICE HAVING PATTERN STRUCTURE | — | 2004-12-14 |
| 6737198 | Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit | — | 2004-05-18 |
| 6517983 | Aberration estimating mask pattern | — | 2003-02-11 |
| 6453274 | Method of forming a pattern using proximity-effect-correction | — | 2002-09-17 |
| 6245470 | Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method | — | 2001-06-12 |
| 6228542 | Photomask method of manufacture method of test/repair and method of use therefor | — | 2001-05-08 |
| 6061188 | Projecting printing apparatus, projection printing method, mask pattern for estimating amplitude aberrations, method of estimating the quantity of amplitude aberration, and amplitude-aberration estimating filter | — | 2000-05-09 |
| 5815685 | Apparatus and method for correcting light proximity effects by predicting mask performance | — | 1998-09-29 |
| 5538818 | Reflection Photomask | — | 1996-07-23 |
| 5524039 | Projection exposure apparatus | — | 1996-06-04 |
| 5481624 | Mask inspecting method and mask detector | — | 1996-01-02 |
| 5455130 | Photomask comprising an optical path adjusting film | — | 1995-10-03 |
| 5436761 | Projection exposure apparatus and polarizer | — | 1995-07-25 |
| 5432588 | Semiconductor device and method of making the semiconductor device | — | 1995-07-11 |
| 5422206 | Photomask and method of manufacturing the same | — | 1995-06-06 |
| 5418599 | Exposure method | — | 1995-05-23 |