Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for detecting phase defects in lithographic masks and semiconductor wafers

Method and system for detecting phase defects in lithographic masks and semiconductor wafers

US Patent 6727512 · Granted Apr 27, 2004

Estimated economic value: $29,881,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

EUV in-situ linearity calibration for TDI image sensors using test photomasks2023
Vapor as a protectant and lifetime extender in optical systems2023
System, method and apparatus for polarization control2022
Delivery of light into a vacuum chamber using an optical fiber2022
Multiple working distance height sensor using multiple wavelengths2021
Inspection system with non-circular pupil2021
System, method and apparatus for polarization control2021
Minimizing filed size to reduce unwanted stray light2020
Dark-field inspection using a low-noise sensor2019
Surface defect inspection with large particle monitoring and laser power control2019
Methods and apparatus for polarizing reticle inspection2019
System, method and apparatus for polarization control2018