Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of extreme ultraviolet mask engineering

Method of extreme ultraviolet mask engineering

US Patent 6656643 · Granted Dec 2, 2003

Estimated economic value: $441,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus to reduce thermal variations within an integrated circuit d2014
Strained channel transistor structure and method2014
Method for fabricating a semiconductor device having an epitaxial channel and tr2014
Integrated circuit and method of fabrication thereof2013
Methods for reducing loading effects during film formation2013
Processing with reduced line end shortening ratio2013
Method of forming high-k dielectric stop layer for contact hole opening2013
Implementation of temperature-dependent phase switch layer for improved temperat2012
Method and apparatus to reduce thermal variations within an integrated circuit d2012
Integrated circuit and method of fabrication thereof2011
Method for fabricating a semiconductor device having an epitaxial channel and tr2011
Multi-variable regression for metrology2011