{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Plasma etch process for nonhomogenous film", "item": "https://www.patentleaderboard.com/patent/6599839"}]}
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Home › Plasma etch process for nonhomogenous film

Plasma etch process for nonhomogenous film

US Patent 6599839 · Granted Jul 29, 2003

Estimated economic value: $3,092,000 ⓘ

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