Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of avoiding the effects of lack of uniformity in trench isolated integrated circuits

Method of avoiding the effects of lack of uniformity in trench isolated integrated circuits

US Patent 6586313 · Granted Jul 1, 2003

Estimated economic value: $14,325,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Indexing of electronic devices distributed on different chips2018
Indexing of electronic devices distributed on different chips2015
Process for contact opening definition for active element electrical connections2007
Method for reducing non-uniformity or topography variation between an array and 2007
Method for manufacturing non-volatile memory device2004
Planarization structure and method for dielectric layers2003
Selective salicidation process for electronic devices integrated in a semiconduc2003
Method of fabricating non-volatile memory devices integrated in a semiconductor 2002
Autoaligned etching process for realizing word lines in memory devices integrate2002
Electronic memory device having bit lines with block selector switches2001
Autoaligned etching process for realizing word lines and improving the reliabili2001
Method of planarizing a semiconductor device by depositing a dielectric ply stru2000