Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques

Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques

US Patent 6553562 · Granted Apr 22, 2003

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Virtual cross metrology-based modeling of semiconductor fabrication processes2023
Hotspot detection based on litho-aware machine learning2021
Layout content analysis for source mask optimization acceleration2016
Automated design layout pattern correction based on context-aware patterns2014
Stitch insertion for reducing color density differences in double patterning tec2014
Methods involving pattern matching to identify and resolve potential non-double-2014
Layout pattern correction for integrated circuits2014
Layout content analysis for source mask optimization acceleration2014
Methods for analyzing design rules2013
Methods for decomposing circuit design layouts and for fabricating semiconductor2013
Methods for quantitatively evaluating the quality of double patterning technolog2013
Analysis optimizer2013