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Home › METHOD OF INCREASING OVERLAY ACCURACY IN AN EXPOSURE STEP AND OVERLAY DISPLACEMENT MEASURING DEVICE FOR DETERMINING OPTIMUM MEASUREMENT FOCUS PLANE BY VARIATION IN MAGNITUDES OF DISPLACEMENT OF TWO OVERLAY INSPECTION MARKS

METHOD OF INCREASING OVERLAY ACCURACY IN AN EXPOSURE STEP AND OVERLAY DISPLACEMENT MEASURING DEVICE FOR DETERMINING OPTIMUM MEASUREMENT FOCUS PLANE BY VARIATION IN MAGNITUDES OF DISPLACEMENT OF TWO OVERLAY INSPECTION MARKS

US Patent 6553137 · Granted Apr 22, 2003

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