Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6662145 | Method, equipment, and recording medium for controlling exposure accuracy | — | 2003-12-09 |
| 6553137 | METHOD OF INCREASING OVERLAY ACCURACY IN AN EXPOSURE STEP AND OVERLAY DISPLACEMENT MEASURING DEVICE FOR DETERMINING OPTIMUM MEASUREMENT FOCUS PLANE BY VARIATION IN MAGNITUDES OF DISPLACEMENT OF TWO OVERLAY INSPECTION MARKS | — | 2003-04-22 |
| 6338925 | Photolithography processing based on fresh calibration parameter values | — | 2002-01-15 |
| 6338971 | Method of correcting alignment | Tsuneo Yasuda | 2002-01-15 |
| 6239858 | Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatus | — | 2001-05-29 |
| 6229618 | Method of improving registration accuracy and method of forming patterns on a substrate using the same | — | 2001-05-08 |
| 6165656 | Overlay error determination mark considering influence of aberration | — | 2000-12-26 |
| 5939226 | Aberration estimation reticle for determining overlay error | — | 1999-08-17 |
| 5856054 | Method of alignment in exposure step through array error and shot error determinations | — | 1999-01-05 |
| 5792580 | Method of aligning reticle pattern | — | 1998-08-11 |
| 5773180 | Measuring method of a relative positional deviation of reticle pattern | — | 1998-06-30 |
| 5671165 | Method of determining position offset of a pattern | — | 1997-09-23 |