Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Overlay error determination mark considering influence of aberration

Overlay error determination mark considering influence of aberration

US Patent 6165656 · Granted Dec 26, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method, equipment, and recording medium for controlling exposure accuracy2003
METHOD OF INCREASING OVERLAY ACCURACY IN AN EXPOSURE STEP AND OVERLAY DISPLACEME2003
Photolithography processing based on fresh calibration parameter values2002
Method of correcting alignment2002
Exposure method, exposure apparatus and semiconductor device manufactured by usi2001
Method of improving registration accuracy and method of forming patterns on a su2001
Aberration estimation reticle for determining overlay error1999
Method of alignment in exposure step through array error and shot error determin1999
Method of aligning reticle pattern1998
Measuring method of a relative positional deviation of reticle pattern1998
Method of determining position offset of a pattern1997