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Home › Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method

Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method

US Patent 6479212 · Granted Nov 12, 2002

Estimated economic value: $292,000 ⓘ

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