Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers

High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers

US Patent 6447651 · Granted Sep 10, 2002

Estimated economic value: $25,752,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Masking member, and method for coating hollow member2025
Showerhead design to control stray deposition2025
Semiconductor processing chambers and methods for deposition and etch2025
Semiconductor processing chambers and methods for deposition and etch2025
Servo amplifier2025
Servo amplifier2025
Vertically adjustable plasma source2025
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-2025
Semiconductor processing chamber to accommodate parasitic plasma formation2025
Thin layer deposition with plasma pulsing2025
Servo amplifier2024
Single chamber flowable film formation and treatments2024